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Pàgina inicial > Articles > Articles publicats > Hydrogen desorption in SiGe films : |
Data: | 1997 |
Resum: | A model to explain the hydrogen desorption kinetics in SiGe alloys is presented. This is an extension of a previous desorption model of hydrogen from Si, that considers the presence of three dimer types in the surface in which hydrogen atoms tend to pair before the desorptionreaction. Surfacediffusion is included in the model. The comparison with experimental results shows that desorption is a diffusion limited process. |
Drets: | Tots els drets reservats. |
Llengua: | Anglès |
Document: | Article ; recerca ; Versió publicada |
Matèria: | Desorption ; Diffusion ; Atom reactions ; Atom surface interactions ; Chemical interdiffusion ; Hydrogen reactions ; Reaction kinetics modeling ; Surface reactions |
Publicat a: | Applied physics letters, Vol. 70, Issue 24 (June 1997) , p. 3287-3289, ISSN 1077-3118 |
4 p, 307.5 KB |