Reversible dielectric breakdown in ultra Hf based high-k stacks under current limited stresses
Crespo Yepes, Albert (Universitat Autònoma de Barcelona. Departament d'Enginyeria Electrònica)
Martin Martinez, Javier (Universitat Autònoma de Barcelona. Departament d'Enginyeria Electrònica)
Rodríguez Martínez, Rosana (Universitat Autònoma de Barcelona. Departament d'Enginyeria Electrònica)
Nafría i Maqueda, Montserrat (Universitat Autònoma de Barcelona. Departament d'Enginyeria Electrònica)
Aymerich Humet, Xavier (Universitat Autònoma de Barcelona. Departament d'Enginyeria Electrònica)

Date:	2009
Abstract:	The effects of a current-limited breakdown (BD) on the post-BD current of MOS capacitors with a thin high-k dielectric stack have been analysed. A strong current reduction after BD and, consequently, a partial recovery of the insulating properties of the dielectric stack is observed. The similarities with the Resistive Switching phenomenon observed in MIM structures for memory applications are discussed.
Grants:	Ministerio de Ciencia e Innovación TEC2007-61294 Agència de Gestió d'Ajuts Universitaris i de Recerca 2005/SGR-1224
Rights:	Tots els drets reservats.
Language:	Anglès
Document:	Article ; recerca ; Versió sotmesa a revisió
Subject:	Dielectric breakdown ; Resistive switching ; High-k reliability ; CMOS process
Published in:	Microelectronics reliability, Vol. 49, Issue 9-11 (2009) , p. 1024-1028, ISSN 0026-2714

DOI: 10.1016/j.microrel.2009.06.029

Pre-print 11 p, 963.5 KB

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Research literature > UAB research groups literature > Research Centres and Groups (research output) > Engineering > The Reliability of Electron Devices and Circuits group (REDEC)
Articles > Research articles
Articles > Published articles