Index of artpub/2001/116266/

Porti i Pujal, Marc
Nanometer-scale electrical characterization of stressed ultrathin SiO2 films using conducting atomic force microscopy
2001
https://ddd.uab.cat/record/116266
[ICO]NameLast modifiedSizeDescription

[PARENTDIR]Parent Directory  -  
[   ]1=Porti_i_Pujal,_Marc2022-06-29 13:23 20  
[   ]2=Nanometer-scale_electrical_characterization...2022-06-29 13:23 119  
[   ]3=20012022-06-29 13:23 5  
[   ]4=1162662022-06-29 13:23 34  
[TXT]116266.dirinfo2024-10-02 05:14 317  
[   ]116266.du2024-10-02 05:14 48  
[TXT]116266.dupdirs2024-10-02 05:14 0  
[TXT]116266.dupfiles2024-10-02 05:14 0  
[TXT]116266.errors2024-10-02 05:14 0  
[TXT]116266.md52024-10-02 05:14 67  
[TXT]116266.sha12024-10-02 05:14 75  
[TXT]116266.sha2562024-10-02 05:14 99  
[TXT]116266.stats2024-10-02 05:14 222  
[IMG]appphylet_a2001m5v78n26p4181.gif2014-02-26 11:07 15K 
[IMG]appphylet_a2001m5v78n26p4181.ico2014-02-26 11:07 12K 
[TXT]appphylet_a2001m5v78n26p4181.info2014-02-26 11:07 6.9K 
[   ]appphylet_a2001m5v78n26p4181.pdf2014-02-26 11:07 388K 
[TXT]appphylet_a2001m5v78n26p4181.txt2014-02-26 11:07 22K