Index of tesis/2003/tdx-1113103-152958/

Porti i Pujal, Marc
Caracterització a escala nanomètrica de la degradació i ruptura dielèctrica del SiO2 en dispositius MOS mitjançant C-AFM
2003
https://ddd.uab.cat/record/38363
[ICO]NameLast modifiedSizeDescription
[PARENTDIR]Parent Directory  -  
[ ]1=Porti_i_Pujal,_Marc2022-11-08 17:26 20  
[ ]2=Caracteritzacio_a_escala_nanometrica_de...2022-11-08 17:26 126  
[ ]3=20032022-11-08 17:26 5  
[ ]4=383632022-11-08 17:26 33  
[IMG]mpp1de3.gif2003-11-13 15:31 202K 
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[TXT]mpp1de3.txt2003-11-13 15:31 104K 
[IMG]mpp2de3.gif2003-11-13 15:31 87K 
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[TXT]mpp2de3.txt2003-11-13 15:31 64K 
[IMG]mpp3de3.gif2003-11-13 15:31 171K 
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[TXT]mpp3de3.txt2003-11-13 15:31 112K 
[TXT]robots.txt2007-02-12 15:48 550  
[TXT]tdx-1113103-152958.dirinfo2024-09-16 18:07 362  
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[ ]tdx-1113103-152958.par22024-09-16 18:07 40K 
[TXT]tdx-1113103-152958.sha12024-09-16 18:07 162  
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[ ]tdx-1113103-152958.vol000+100.par22024-09-16 18:07 505K 
[TXT]tdx.html2010-04-19 17:04 15K 
[TXT]tdx.html.orig2009-04-23 21:11 15K