Resultados globales: 2 registros encontrados en 0.01 segundos.
Artículos, Encontrados 2 registros
Artículos Encontrados 2 registros  
1.
23 p, 1.1 MB Order quantification of hexagonal periodic arrays fabricated by in situ solvent-assisted nanoimprint lithography of block copolymers / Delgado Simao, Claudia (Institut Català de Nanociència i Nanotecnologia) ; Khunsin, Worawut (Institut Català de Nanociència i Nanotecnologia) ; Kehagias, Nikolaos (Institut Català de Nanociència i Nanotecnologia) ; Salaun, Mathieu (Centre national de la recherche scientifique. Laboratoire des Technologies de la Microélectronique) ; Zelsmann, Marc (Centre national de la recherche scientifique. Laboratoire des Technologies de la Microélectronique) ; Morris, Michael A. (Tyndall National Institute. School of Chemistry) ; Sotomayor Torres, Clivia M. (Institut Català de Nanociència i Nanotecnologia)
Directed self-assembly of block copolymer polystyrene-b-polyethylene oxide (PS-b-PEO) thin film was achieved by a one-pot methodology of solvent vapor assisted nanoimprint lithography (SAIL). Simultaneous solvent-anneal and imprinting of a PS-b-PEO thin film on silicon without surface pre-treatments yielded a 250 nm line grating decorated with 20 nm diameter nanodots array over a large surface area of up to 4′ wafer scale. [...]
2014 - 10.1088/0957-4484/25/17/175703
Nanotechnology, Vol. 25, Issue 17 (May 2014) , art. 175703  
2.
7 p, 1.4 MB Self-Assembled Nanofeatures in Complex Three-Dimensional Topographies via Nanoimprint and Block Copolymer Lithography Methods / Cummins, Cian (Trinity College Dublin) ; Borah, Dipu (Trinity College Dublin) ; Rasappa, Sozaraj (Tampere University of Technology) ; Senthamaraikannan, Ramsankar (Trinity College Dublin) ; Delgado Simao, Claudia (Institut Català de Nanociència i Nanotecnologia) ; Francone, Achille (Institut Català de Nanociència i Nanotecnologia) ; Kehagias, Nikolaos (Institut Català de Nanociència i Nanotecnologia) ; Sotomayor Torres, Clivia M. (Institut Català de Nanociència i Nanotecnologia) ; Morris, Michael A. (Trinity College Dublin)
Achieving ultrasmall dimensions of materials and retaining high throughput are critical fabrication considerations for nanotechnology use. This article demonstrates an integrated approach for developing isolated sub-20 nm silicon oxide features through combined "top-down" and "bottom-up" methods: nanoimprint lithography (NIL) and block copolymer (BCP) lithography. [...]
2017 - 10.1021/acsomega.7b00781
ACS omega, Vol. 2, Issue 8 (August 2017) , p. 4417-4423  

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1 Morris, Michael
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