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25 p, 1.6 MB Lateral Magnetically Modulated Multilayers by Combining Ion Implantation and Lithography / Menéndez Dalmau, Enric (Katholieke Universiteit te Leuven (1970- )) ; Modarresi, Hiwa (Katholieke Universiteit te Leuven (1970- )) ; Petermann, Claire (Katholieke Universiteit te Leuven (1970- )) ; Nogués, Josep (Institut Català de Nanociència i Nanotecnologia) ; Domingo Marimon, Neus (Institut Català de Nanociència i Nanotecnologia) ; Liu, Haoliang (Katholieke Universiteit te Leuven (1970- )) ; Kirby, Brian (Brian J.) (NNational Institute of Standards and Technology (Gaithersburg, Estats Units d'Amèrica)) ; Mohd, Amir Syed (Jülich Centre for Neutron Science (Jülich, Alemanya)) ; Salhi, Zahir (Jülich Centre for Neutron Science (Jülich, Alemanya)) ; Babcock, Earl (Jülich Centre for Neutron Science (Jülich, Alemanya)) ; Mattauch, Stephan (Jülich Centre for Neutron Science (Jülich, Alemanya)) ; Van Haesendonck, Chris (Katholieke Universiteit te Leuven (1970- )) ; Vantomme, André (Katholieke Universiteit te Leuven (1970- )) ; Temst, Kristiaan (Katholieke Universiteit te Leuven (1970- ))
The combination of lithography and ion implantation is demonstrated to be a suitable method to prepare lateral multilayers. A laterally, compositionally, and magnetically modulated microscale pattern consisting of alternating Co (1. [...]
2017 - 10.1002/smll.201603465
Small, Vol. 13 Núm. 11 (March 2017) , article 1603465  

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