Resultados globales: 3 registros encontrados en 0.03 segundos.
Artículos, Encontrados 3 registros
Artículos Encontrados 3 registros  
1.
6 p, 510.6 KB Chemical strain and oxidation-reduction kinetics of epitaxial thin films of mixed ionic-electronic conducting oxides determined by x-ray diffraction / Moreno, Roberto (Institut Català de Nanociència i Nanotecnologia) ; Zapata Correa, James Arturo (Institut Català de Nanociència i Nanotecnologia) ; Roqueta, Jaume (Institut Català de Nanociència i Nanotecnologia) ; Bagués Salgueró, Núria (Institut Català de Nanociència i Nanotecnologia) ; Santiso, José (Institut Català de Nanociència i Nanotecnologia)
X-ray diffraction, at high T's and switching between N/air atmospheres, was used to compare the chemical expansion due oxygen non-stoichiometry variations between epitaxial films of different mixed ionic-electronic conductors: LaSrCoO(LSC), BaSrCoFeO(BSCF), LaNiO(LNO), LaNiO(L2NO) and GaBaCoO(GBCO) and LaSrMnO(LSM). [...]
2014 - 10.1149/2.0091411jes
Journal of the Electrochemical Society, Vol. 161, Issue 11 (2014) , p. F3046-F3051  
2.
4 p, 630.0 KB Modification of HF-treated silicon (100) surfaces by scanning tunneling microscopy in air under imaging conditions / Barniol i Beumala, Núria (Universitat Autònoma de Barcelona. Departament d'Enginyeria Electrònica) ; Pérez Murano, Francesc (Universitat Autònoma de Barcelona. Departament d'Enginyeria Electrònica) ; Aymerich Humet, Xavier (Universitat Autònoma de Barcelona. Departament de Física) ; American Physical Society
The modification of HF‐etched silicon (100) surface with a scanning tunneling microscope(STM) operated in air is studied for the first time in samples subjected to the standard HF etching without the follow‐up rinsing in H2O. [...]
1992 - 10.1063/1.107885
Applied physics letters, Vol. 61, Issue 4 (July 1992) , p. 462-464  
3.
4 p, 414.9 KB Local oxidation of silicon surfaces by dynamic force microscopy : nanofabrication and water bridge formation / García, Ricardo (Instituto de Microelectronica de Madrid) ; Calleja, M. (Instituto de Microelectronica de Madrid) ; Pérez Murano, Francesc (Universitat Autònoma de Barcelona. Departament d'Enginyeria Electrònica) ; American Physical Society
Local oxidation of siliconsurfaces by atomic force microscopy is a very promising lithographic approach at nanometer scale. Here, we study the reproducibility, voltage dependence, and kinetics when the oxidation is performed by dynamic force microscopy modes. [...]
1998 - 10.1063/1.121340
Applied physics letters, Vol. 72, Issue 18 (May 1998) , p. 2295-2297  

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