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Early events in the photochemistry of 5-diazo Meldrum's acid : Formation of a product manifold in C-N bound and pre-dissociated intersection seam regions
Li, Huijing (Beijing Institute of Technology. School of Chemistry and Chemical Engineering)
Migani, Annapaola (Institut Català de Nanociència i Nanotecnologia)
Blancafort, Lluís (Institut de Química Computacional i Catàlisi)
Li, Quansong (Beijing Institute of Technology. School of Chemistry and Chemical Engineering)
Li, Zesheng (Beijing Institute of Technology. School of Chemistry and Chemical Engineering)

Fecha: 2016
Resumen: 5-Diazo Meldrum's acid (DMA) undergoes a photo-induced Wolff rearrangement (WR). Recent gas-phase experiments have identified three photochemical products formed in a sub-ps scale after irradiation, a carbene formed after nitrogen loss, a ketene formed after WR and a second carbene formed after nitrogen and CO elimination (A. Steinbacher, et al. Phys. Chem. Chem. Phys. , 2014, 16, 7290-7298). In this work, ground- and excited-state potential energy surfaces (PESs) have been investigated at the MS-CASPT2// CASSCF level. The key element of the PESs is an extended S0/S1 conical intersection seam along the C-N dissociation coordinate. The C-N predissociated region of the seam is accessed after excitation to the bright S2 state, and decay paths from the seam to the three primary products have been characterized. For the ketene and carbene II products, we show two possible formation pathways, a direct and a stepwise one, which suggests that these products may be formed in a bi-modal fashion. We have also characterized two possible mechanisms for triplet formation, one occurring before C-N dissociation involving a (S1/T2/T1) crossing region, and another one through the carbene. In contrast, excitation to S1 leads to a C-N bound region of the seam from where DMA regeneration or diazirine formation is possible, with a preference for the first case. The results are in good agreement with experimental data. Together with our previous work on diazonaphthoquinone, they show the importance of an extended seam in the photochemistry of a-diazoketones.
Ayudas: Ministerio de Ciencia e Innovación RYC-2011-09582
Ministerio de Economía y Competitividad CTQ2015-69363-P
Ministerio de Economía y Competitividad FIS2012-37549-C05-02
Ministerio de Economía y Competitividad UNGI-10-4E-801
Agència de Gestió d'Ajuts Universitaris i de Recerca 2014/SGR-301
Agència de Gestió d'Ajuts Universitaris i de Recerca 2014/SGR-1202
Derechos: Aquest document està subjecte a una llicència d'ús Creative Commons. Es permet la reproducció total o parcial, la distribució, la comunicació pública de l'obra i la creació d'obres derivades, fins i tot amb finalitats comercials, sempre i quan es reconegui l'autoria de l'obra original. Creative Commons
Lengua: Anglès
Documento: Article ; recerca ; Versió publicada
Publicado en: Physical chemistry chemical physics, Vol. 18, Issue 44 (November 2016) , p. 30785-30793, ISSN 1463-9084

DOI: 10.1039/c6cp06290c


9 p, 3.2 MB

El registro aparece en las colecciones:
Documentos de investigación > Documentos de los grupos de investigación de la UAB > Centros y grupos de investigación (producción científica) > Ciencias > Institut Català de Nanociència i Nanotecnologia (ICN2)
Artículos > Artículos de investigación
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 Registro creado el 2019-06-03, última modificación el 2025-12-30



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