Combined laser and atomic force microscope lithography on aluminum : mask fabrication for nanoelectromechanical systems
Abadal Berini, Gabriel (Universitat Autònoma de Barcelona. Departament d'Enginyeria Electrònica)
Boisen, A. (Technical University of Denmark. Mikroelektronik Centret)
Davis, Z. J. (Technical University of Denmark. Mikroelektronik Centret)
Hansen, O. (Technical University of Denmark. Mikroelektronik Centret)
Grey, F. (Technical University of Denmark. Mikroelektronik Centret)
American Physical Society

Date:	1999
Abstract:	A direct-write laser system and an atomic force microscope(AFM) are combined to modify thin layers of aluminum on an oxidizedsilicon substrate, in order to fabricate conducting and robust etch masks with submicron features. These masks are very well suited for the production of nanoelectromechanical systems(NEMS) by reactive ion etching. In particular, the laser-modified areas can be subsequently locally oxidized by AFM and the oxidized regions can be selectively removed by chemical etching. This provides a straightforward means to define the overall conducting structure of a device by laser writing, and to perform submicron modifications by AFMoxidation. The mask fabrication for a nanoscale suspended resonator bridge is used to illustrate the advantages of this combined technique for NEMS.
Rights:	Tots els drets reservats.
Language:	Anglès
Document:	Article ; recerca ; Versió publicada
Subject:	Nanoelectromechanical systems ; Oxidation ; Atomic force microscopes ; Etching ; Nanofabrication ; Aluminium ; Atomic force microscopy ; Laser photolithography ; Microlithography ; Silicon
Published in:	Applied physics letters, Vol. 74, Issue 21 (March 1999) , p. 3206-3208, ISSN 1077-3118

DOI: 10.1063/1.124106

4 p, 370.6 KB

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