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Página principal > Artículos > Artículos publicados > Real-time optical dimensional metrology via diffractometry for nanofabrication |
Fecha: | 2020 |
Resumen: | Surface patterning technologies represent a worldwide growing industry, creating smart surfaces and micro/nanoscale device. The advent of large-area, high-speed imprinting technologies has created an ever-growing need for rapid and non-destructive dimensional metrology techniques to keep pace with the speed of production. Here we present a new real-time optical scatterometry technique, applicable at the mesoscale when optical inspection produces multiple orders of diffraction. We validate this method by inspecting multiple silicon gratings with a variety of structural parameters. These measurements are cross-referenced with FIB, SEM and scanning stylus profilometry. Finally, we measure thermally imprinted structures as a function of imprinting temperature in order to demonstrate the method suitable for in-line quality control in nanoimprint lithography. |
Ayudas: | European Commission 721062 Ministerio de Economía y Competitividad PGC2018-101743-B-I00 Ministerio de Economía y Competitividad SEV-2017-0706 |
Nota: | The ICN2 is funded by the CERCA programme/ Generalitat de Catalunya. |
Derechos: | Aquest document està subjecte a una llicència d'ús Creative Commons. Es permet la reproducció total o parcial, la distribució, la comunicació pública de l'obra i la creació d'obres derivades, fins i tot amb finalitats comercials, sempre i quan es reconegui l'autoria de l'obra original. |
Lengua: | Anglès |
Documento: | Article ; recerca ; Versió publicada |
Materia: | Nanometrology ; Optical techniques ; Techniques and instrumentation |
Publicado en: | Scientific reports, Vol. 10 (2020) , art. 5371, ISSN 2045-2322 |
8 p, 1.5 MB |