Home > Articles > Published articles > Random Telegraph Noise and Bias Temperature Instabilities statistical characterization of Ω-gate FDSOI devices at low voltages |
Date: | 2023 |
Abstract: | Random Telegraph Noise (RTN) and Bias Temperature Instabilities (BTI) are two mechanisms that can significantly reduce the performance and reliability of integrated circuits. In scaled devices, both phenomena are stochastic, so that a statistical analysis is required to accurately evaluate their impact on a particular technology. This study presents such analysis in scaled FD-SOI devices under various gate and drain voltages, ranging from near-threshold to nominal conditions. The combined effect of RTN and BTI is also modeled in a defect-centric context, and the main impact of the different bias conditions is discussed. |
Grants: | Agencia Estatal de Investigación PID2019-103869RB-C32 Agencia Estatal de Investigación BES-2017-081462 |
Rights: | Aquest document està subjecte a una llicència d'ús Creative Commons. Es permet la reproducció total o parcial i la comunicació pública de l'obra, sempre que no sigui amb finalitats comercials, i sempre que es reconegui l'autoria de l'obra original. No es permet la creació d'obres derivades. |
Language: | Anglès |
Document: | Article ; recerca ; Versió acceptada per publicar |
Subject: | Bias temperature instability ; FD-SOI ; Random telegraph noise ; Reliability ; Variability |
Published in: | Solid-state electronics, Vol. 209 (November 2023) , art. 108735, ISSN 1879-2405 |
Available from: 2025-11-30 Postprint |