In situ XPS analysis of the electronic structure of silicon and titanium thin films exposed to low-pressure inductively-coupled RF plasma
Fraxedas, Jordi (Institut Català de Nanociència i Nanotecnologia)
Schütte, Max (ALBA Laboratori de Llum de Sincrotró)
Sauthier, Guillaume (Institut Català de Nanociència i Nanotecnologia)
Tallarida, Massimo (ALBA Laboratori de Llum de Sincrotró)
Ferrer, Salvador (ALBA Laboratori de Llum de Sincrotró)
Carlino, Vincent (IBSS Group Inc.)
Pellegrin, Eric (Carl Zeiss SMT GmbH)

Date:	2021
Abstract:	Carbon contamination of synchrotron and free-electron lasers beamline optics continues to be a major nuisance due to the interaction of the intense photon beams with the surfaces of the optical elements in the presence of residual gases even in ultrahigh vacuum (UHV) conditions. Among the available in situ cleaning strategies, low-pressure radio frequency (RF) plasma treatment has emerged as a useful and relatively simple approach to remove such carbon contamination. However, the irreversible damage that the plasma may induce in such critical surfaces has to be carefully characterized before its general application. In this study, we focus on reducing the amount of carbon from UHV chamber inside surfaces via silicon and titanium coatings using a low-pressure inductively-coupled downstream plasma source and we characterize the surface alterations by in situ X-ray photoemission spectroscopy (XPS). The in situ mirror cleaning is simulated by means of silicon wafers. We observe upward band bending, which translates into lower binding energies of the photoemission lines, that we attribute to the generation of vacancies and trapped charges in the oxide layers.
Grants:	Agencia Estatal de Investigación PGC2018-095032-B-I00 Ministerio de Ciencia e Innovación SEV-2017-0706
Rights:	Aquest document està subjecte a una llicència d'ús Creative Commons. Es permet la reproducció total o parcial, la distribució, i la comunicació pública de l'obra, sempre que no sigui amb finalitats comercials, i sempre que es reconegui l'autoria de l'obra original. No es permet la creació d'obres derivades.
Language:	Anglès
Document:	Article ; recerca ; Versió acceptada per publicar
Published in:	Applied surface science, Vol. 542 (March 2021) , art. 148684, ISSN 0169-4332

DOI: 10.1016/j.apsusc.2020.148684

31 p, 1.5 MB

The record appears in these collections:
Research literature > UAB research groups literature > Research Centres and Groups (research output) > Experimental sciences > Catalan Institute of Nanoscience and Nanotechnology (ICN2)
Research literature > UAB research groups literature > Research Centres and Groups (research output) > Experimental sciences > The ALBA Synchrotron
Articles > Research articles
Articles > Published articles