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In situ XPS analysis of the electronic structure of silicon and titanium thin films exposed to low-pressure inductively-coupled RF plasma
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In situ XPS analysis of the electronic structure of silicon and titanium thin films exposed to low-pressure inductively-coupled RF plasma
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Fraxedas, Jordi
(Institut Català de Nanociència i Nanotecnologia)
;
Schütte, Max
(ALBA Laboratori de Llum de Sincrotró) ;
Sauthier, Guillaume
(Institut Català de Nanociència i Nanotecnologia) ;
Tallarida, Massimo
(ALBA Laboratori de Llum de Sincrotró) ;
Ferrer, Salvador
(ALBA Laboratori de Llum de Sincrotró) ;
Carlino, Vincent
(IBSS Group Inc.) ;
Pellegrin, Eric
(Carl Zeiss SMT GmbH)
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