Inkjet-printed chemical solution Y₂O₃ layers for planarization of technical substrates
Vilardell, Marta (Oxolutia S.L.)
Fornell Beringues, Jordina (Universitat Autònoma de Barcelona. Departament de Física)
Sort Viñas, Jordi (Universitat Autònoma de Barcelona. Departament de Física)
Vlad, Roxana (Oxolutia S.L.)
Fernández, Juan Carlos (KAO-Chimigraf)
Puig, Joaquim (KAO-Chimigraf)
Usoskin, Alexander (Bruker HTS GmbH)
Palau Masoliver, Anna (Institut de Ciència de Materials de Barcelona)
Puig i Molina, Mª Teresa (Institut de Ciència de Materials de Barcelona)
Obradors, Xavier (Institut de Ciència de Materials de Barcelona)
Calleja, Albert (Oxolutia S.L.)

Fecha: 2017
Resumen: The implementation of the Chemical Solution Deposition (CSD) methodology with 23 the Drop on Demand (DoD) inkjet printing (IJP) technology has been successfully employed to 24 develop a Solution Deposition Planarization (SDP) method. We have used nanocrystalline yttrium 25 oxide (Y₂O₃) to decrease the roughness of technical metallic substrates by filling the surface 26 imperfections and thus avoiding costly polishing steps. This alternative process represents an 27 outstanding methodology to reduce the final cost of the 2G coated conductors manufacturing. 28 Two Y₂O₃ metalorganic precursor inks formulations were successfully developed and tested to 29 obtain surfaces as smooth as possible with adequate mechanical properties to hold the internal 30 stresses developed during the subsequent layers growth. 31 By using these inks as precursors for IJP and after a proper tuning of the rheological and 32 wetting parameters, we firstly obtained short length uniform 100nm-thick Y₂O₃-SDP films on 33 unpolished stainless steel substrate from Bruker HTS. The scalability of the reel to reel (R2R)-IJP 34 process to 100m is then demonstrated on metallic substrates as well. A complete characterization of 35 the prepared short and long length SDP-Y₂O₃ inkjet-printed layers was carried out by optical 36 microscopy, FIB-SEM (Focus Ion Beam coupled to Scanning Electron Microscopy), XRD (X-Ray 37 Diffraction), AFM (Atomic Force Microscopy), reflectometry and nanoindentation techniques. Then, 38 the morphology, thickness, crystallinity and mechanical properties were evaluated, together with 39 the surface roughness in order to assess the resulting layer planarity. The impact of planarity was 40 additionally studied via growth of biaxially textured buffer layers as well as further functional 41 layers. 1. 1µm-thick YSZ layers with in-plane textures better than the SS polished reference were 42 successfully deposited on top of the 100 nm SDP-Y2O3 films yielding 50% of Ic in contrast to the 43 standard reference.
Nota: Número d'acord de subvenció EC/FP7/280432
Nota: Número d'acord de subvenció MINECO/RTC-2015-3640-3
Nota: Número d'acord de subvenció MINECO/SEV-2015-0496
Nota: Número d'acord de subvenció MINECO/MAT2015-68994-REDC
Nota: Número d'acord de subvenció MINECO/MAT2014-51778-C2-1-R
Derechos: Aquest document està subjecte a una llicència d'ús Creative Commons. Es permet la reproducció total o parcial, la distribució, la comunicació pública de l'obra i la creació d'obres derivades, fins i tot amb finalitats comercials, sempre i quan es reconegui l'autoria de l'obra original. Creative Commons
Lengua: Anglès
Documento: article ; recerca ; publishedVersion
Materia: Inkjet printing ; Chemical solution deposition ; Functional ceramic oxide coatings ; Solution deposition Planarization ; Technical metallic substrates
Publicado en: Coatings, Vol. 7, issue 12 (2017) , art. 227, ISSN 2079-6412

16 p, 13.2 MB

El registro aparece en las colecciones:
Documentos de investigación > Documentos de los grupos de investigación de la UAB > Centros y grupos de investigación (producción científica) > Ciencias > Grupo de nanoingeniería de materiales, nanomagnetismo y nanomecánica (Gnm3)
Artículos > Artículos de investigación
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 Registro creado el 2018-04-18, última modificación el 2020-08-08

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