Defects in nano-imprint lithography line patterns : computational modelling and measurement accuracy - Constantoudis, Vassilios (Institute of Nanoscience and Nanotechnology (Grècia)) ; Whitworth, Guy L. (Institut Català de Nanociència i Nanotecnologia) ; Kehagias, Nikolaos (Institut Català de Nanociència i Nanotecnologia) ; Papavieros, George (Aristotle University of Thessaloniki. Physics Department) ; Sotomayor Torres, Clivia M. (Institut Català de Nanociència i Nanotecnologia) ; Gogolides, Evangelos (Institute of Nanoscience and Nanotechnology (Grècia))
 
Comments (0) | Reviews (0)
Start a discussion about any aspect of this document.

 Subscribe to this discussion. You will then receive all new comments by email.

Add comment


Once logged in, authorized users can also attach files.
Note: you have not defined your nickname.
N/D will be displayed as the author of this comment.
          You can use some HTML tags: <a href>, <strong>, <blockquote>, <br />, <p>, <em>, <ul>, <li>, <b>, <i>