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Pàgina inicial > Articles > Articles publicats > A SnS2 molecular precursor for conformal nanostructured coatings |
Data: | 2020 |
Resum: | We present a simple, versatile, and scalable procedure to produce SnS nanostructured layers based on an amine/thiol-based molecular ink. The ratios amine/thiol and Sn/S, and the reaction conditions, are systematically investigated to produce phase-pure SnS planar and conformal layers with a tremella-like SnS morphology. Such nanostructured layers are characterized by excellent photocurrent densities. The same strategy can be used to produce SnS-graphene composites by simply introducing graphene oxide (GO) into the initial solution. Conveniently, the solvent mixture is able to simultaneously dissolve the Sn and Se powders and reduce the GO. Furthermore, SnSSe ternary coatings and phase-pure SnSe can be easily produced by simply incorporating proper amounts of Se into the initial ink formulation. Finally, the potential of this precursor ink to produce gram-scale amounts of unsupported SnS is investigated. _. |
Ajuts: | Ministerio de Economía y Competitividad ENE2016-77798-C4-3-R Ministerio de Economía y Competitividad ENE2017-85087-C3 Ministerio de Economía y Competitividad RTI2018-093996-B-C31 Ministerio de Economía y Competitividad SEV-2017-0706 Agència de Gestió d'Ajuts Universitaris i de Recerca 2017/SGR-1246 Agència de Gestió d'Ajuts Universitaris i de Recerca 2017/SGR-327 Agència de Gestió d'Ajuts Universitaris i de Recerca 2017/SGR-128 |
Nota: | ICN2 is funded by the CERCA Programme/Generalitat de Catalunya. J. Llorca is a Serra Húnter Fellow and is grateful to ICREA Academia program. Part of the present work has been performed in the framework of Universitat Autònoma de Barcelona Materials Science Ph.D. program. T.Z. has received funding from the CSC-UAB PhD scholarship program. |
Drets: | Tots els drets reservats. |
Llengua: | Anglès |
Document: | Article ; recerca ; Versió sotmesa a revisió |
Matèria: | Graphene composites ; Initial solution ; Molecular precursor ; Nano-structured layer ; Nanostructured coatings ; Photocurrent density ; Reaction conditions ; Ternary coatings |
Publicat a: | Chemistry of materials, Vol. 32 issue 5 (March 2020) , p. 2097-2106, ISSN 1520-5002 |
Preprint 25 p, 4.0 MB |