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Resonant MEMS pressure sensor in 180 nm CMOS technology obtained by BEOL isotropic etching - Mata-Hernandez, Diana (Universitat Politècnica de Catalunya. Departament d'Enginyeria Electrònica) ; Fernández Martínez, Daniel (Institut de Física d'Altes Energies) ; Banerji, Saoni (University of Tartu. Institute of Technology. Intelligent Materials and Systems Laboratory) ; Madrenas, Jordi (Universitat Politècnica de Catalunya. Departament d'Enginyeria Electrònica)
 
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