Two-step ALD process for non-oxide ceramic deposition : the example of boron nitride
Hossain, Ali (Universite Claude Bernard Lyon 1)
Souvignet, Thomas (Universite Claude Bernard Lyon 1)
Innis, Neil R. (Universite Claude Bernard Lyon 1)
Hao, Wenjun (Universite Claude Bernard Lyon 1)
Boisron, Olivier (Universite Claude Bernard Lyon 1)
Florea, Ileana (Université Côte d'Azur)
Xiao, Peng (Institut Català de Nanociència i Nanotecnologia)
Sledzinska, Marianna (Institut Català de Nanociència i Nanotecnologia)
Journet, Catherine (Universite Claude Bernard Lyon 1)
Marichy, Catherine (Universite Claude Bernard Lyon 1)

Fecha:	2024
Resumen:	Atomic layer deposition (ALD) based on polymer-derived ceramics (PDCs) chemistry is used for the fabrication of boron nitride thin films from reaction between trichloroborazine and hexamethyldisilazane. The transposition of the PDCs route to ALD is highly appealing for depositing ceramics, especially non-oxide ones, as it offers various molecular precursors. From a two-step approach composed of an ALD process forming a so-called preceramic film and its subsequent ceramization, conformal and homogenous BN layers are successfully synthesized on various inorganic substrates. In the first stage, smooth polyborazine coatings are obtained at a temperature as low as 90 °C. The saturation and self-limitation of the ALD gas-surface reactions are verified. Intriguingly, three ALD windows seem to exist and are attributed to change in ligand exchange. After the ceramization stage using a heat treatment, conformal near-stoichiometric BN layers are obtained. Their structure in terms of crystallinity can be adjusted from amorphous to well-crystalline sp phase by controlling the treatment temperature. In particular, a crystallization onset occurs at 1000 °C and well defined sp crystalline planes oriented parallel to the surface are noted after ceramization at 1350 °C. Finally, side-modification of the substrate surface induced by the thermal treatment appears to impact on the final BN topography and defect generation.
Ayudas:	Agencia Estatal de Investigación SEV-2017-0706 Agencia Estatal de Investigación PCI2021-122092-2A
Derechos:	Aquest document està subjecte a una llicència d'ús Creative Commons. Es permet la reproducció total o parcial, la distribució, la comunicació pública de l'obra i la creació d'obres derivades, fins i tot amb finalitats comercials, sempre i quan es reconegui l'autoria de l'obra original.
Lengua:	Anglès
Documento:	Article ; recerca ; Versió publicada
Materia:	Atomic layer deposition ; Boron nitride ; Thin film ; Polymer derived ceramics
Publicado en:	JPhys materials, Vol. 7, Issue 3 (June 2024) , art. 35006, ISSN 2515-7639

DOI: 10.1088/2515-7639/ad561e

14 p, 4.4 MB

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