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In-line metrology for roll-to-roll UV assisted nanoimprint lithography using diffractometry
Kreuzer, Martin (Institut Català de Nanociència i Nanotecnologia)
Whitworth, Guy L. (Institut Català de Nanociència i Nanotecnologia)
Francone, Achille (Institut Català de Nanociència i Nanotecnologia)
Gomis-Bresco, Jordi (Institut Català de Nanociència i Nanotecnologia)
Kehagias, Nikolaos (Institut Català de Nanociència i Nanotecnologia)
Sotomayor Torres, Clivia M. (Institut Català de Nanociència i Nanotecnologia)

Date: 2018
Abstract: We describe and discuss the optical design of a diffractometer to carry out in-line quality control during roll-to-roll nanoimprinting. The tool measures diffractograms in reflection geometry, through an aspheric lens to gain fast, non-invasive information of any changes to the critical dimensions of target grating structures. A stepwise tapered linear grating with constant period was fabricated in order to detect the variation in grating linewidth through diffractometry. The minimum feature change detected was ∼40 nm to a precision of 10 nm. The diffractometer was then integrated with a roll-to-roll UV assisted nanoimprint lithography machine to gain dynamic measurements in situ.
Grants: European Commission 721062
European Commission 604668
Ministerio de Economía y Competitividad FIS2015-70862-P
Ministerio de Economía y Competitividad SEV-2013-0295
Note: En publicar-se l'article, l'autor Martin Kreuzer treballa a: ALBA Laboratori de Llum de Sincrotró
Rights: Aquest document està subjecte a una llicència d'ús Creative Commons. Es permet la reproducció total o parcial, la distribució, la comunicació pública de l'obra i la creació d'obres derivades, fins i tot amb finalitats comercials, sempre i quan es reconegui l'autoria de l'obra original. Creative Commons
Language: Anglès
Document: Article ; recerca ; Versió publicada
Subject: Critical dimension ; Feature changes ; Grating structures ; In-line metrology ; Linear gratings ; Nano-imprinting ; Reflection geometry ; UV-assisted nanoimprint lithography
Published in: APL materials, Vol. 6, Issue 5 (May 2018) , art. 58502, ISSN 2166-532X

DOI: 10.1063/1.5011740


7 p, 1.5 MB

The record appears in these collections:
Research literature > UAB research groups literature > Research Centres and Groups (research output) > Experimental sciences > Catalan Institute of Nanoscience and Nanotechnology (ICN2)
Research literature > UAB research groups literature > Research Centres and Groups (research output) > Experimental sciences > The ALBA Synchrotron
Articles > Research articles
Articles > Published articles

 Record created 2019-06-03, last modified 2024-02-14



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