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| Pàgina inicial > Articles > Articles publicats > Independent Tuning of Optical Transparency Window and Electrical Properties of Epitaxial SrVO3 Thin Films by Substrate Mismatch |
(Institut de Ciència de Materials de Barcelona) (ALBA Laboratori de Llum de Sincrotró) (Universitat de Barcelona. Departament d'Enginyeria Electrònica i Biomèdica) (Universitat de Barcelona. Departament d'Electrònica) (Universitat de Barcelona. Departament d'Electrònica) (Institut Català de Nanociència i Nanotecnologia) (Institut de Ciència de Materials de Barcelona) (Institut de Ciència de Materials de Barcelona) (ALBA Laboratori de Llum de Sincrotró) (ALBA Laboratori de Llum de Sincrotró) (Institut de Ciència de Materials de Barcelona)
| Data: | 2019 |
| Resum: | Transparent metallic oxides are pivotal materials in information technology, photovoltaics, or even in architecture. They display the rare combination of metallicity and transparency in the visible range because of weak interband photon absorption and weak screening of free carriers to impinging light. However, the workhorse of current technology, indium tin oxide (ITO), is facing severe limitations and alternative approaches are needed. AMO perovskites, M being a nd transition metal, and A an alkaline earth, have a genuine metallic character and, in contrast to conventional metals, the electron-electron correlations within the nd band enhance the carriers effective mass (m*) and bring the transparency window limit (marked by the plasma frequency, ω*) down to the infrared. Here, it is shown that epitaxial strain and carrier concentration allow fine tuning of optical properties (ω*) of SrVO films by modulating m* due to strain-induced selective symmetry breaking of 3d-t(xy, yz, xz) orbitals. Interestingly, the DC electrical properties can be varied by a large extent depending on growth conditions whereas the optical transparency window in the visible is basically preserved. These observations suggest that the harsh conditions required to grow optimal SrVO films may not be a bottleneck for their future application. |
| Ajuts: | Ministerio de Economía y Competitividad SEV-2015-0496 Ministerio de Economía y Competitividad MAT2017-85232-R Ministerio de Economía y Competitividad MAT2016-79455-P Agència de Gestió d'Ajuts Universitaris i de Recerca 2017/SGR-1377 Agència de Gestió d'Ajuts Universitaris i de Recerca 2017/SGR-776 |
| Drets: | Tots els drets reservats.  |
| Llengua: | Anglès |
| Document: | Article ; recerca ; Versió acceptada per publicar |
| Matèria: | Correlated metal oxides ; Orbital occupancy ; Plasma frequency ; Strontium vanadate ; Transparent conducting oxides |
| Publicat a: | Advanced functional materials, Vol. 29, Issue 37 (September 2019) , art. 1904238, ISSN 1616-3028 |
36 p, 1.8 MB |
