A comparative study of the influence of the deposition technique (electrodeposition versus sputtering) on the properties of nanostructured Fe70 Pd30 films
Cialone, Matteo (Istituto Nazionale di Ricerca Metrologica)
Fernandez-Barcia, Monica (IFW Dresden. Institute for Complex Materials)
Celegato, Federica (Istituto Nazionale di Ricerca Metrologica)
Coisson, Marco (Istituto Nazionale di Ricerca Metrologica)
Barrera, Gabriele (Istituto Nazionale di Ricerca Metrologica)
Uhlemann, Margitta (IFW Dresden. Institute for Complex Materials)
Gebert, Annett (IFW Dresden. Institute for Complex Materials)
Sort Viñas, Jordi (Universitat Autònoma de Barcelona. Departament de Física)
Pellicer Vilà, Eva Maria (Universitat Autònoma de Barcelona. Departament de Física)
Rizzi, Paola (Università di Torino. Dipartimento di Chimica)
Tiberto, Paola (Istituto Nazionale di Ricerca Metrologica)

Data:	2020
Resum:	Sputtering and electrodeposition are among the most widespread techniques for metallic thin film deposition. Since these techniques operate under different principles, the resulting films typically show different microstructures even when the chemical composition is kept fixed. In this work, films of FePd were produced in a thickness range between 30 and 600 nm, using both electrodeposition and sputtering. The electrodeposited films were deposited under potentiostatic regime from an ammonia sulfosalicylic acid-based aqueous solution. Meanwhile, the sputtered films were deposited from a composite target in radio frequency regime. Both approaches were proven to yield high quality and homogenous films. However, their crystallographic structure was different. Although all films were polycrystalline and Fe and Pd formed a solid solution with a body-centered cubic structure, a palladium hydride phase was additionally detected in the electrodeposited films. The occurrence of this phase induced internal stress in the films, thereby influencing their magnetic properties. In particular, the thickest electrodeposited FePd films showed out-of-plane magnetic anisotropy, whereas the magnetization easy axis lied in the film plane for all the sputtered films. The domain pattern of the electrodeposited films was investigated by magnetic force microscopy. Finally, nanoindentation studies highlighted the high quality of both the sputtered and electrodeposited films, the former exhibiting higher reduced Young's modulus and Berkovich hardness values.
Ajuts:	European Commission 642642 Agencia Estatal de Investigación MAT2017-86357-C3-1-R Agència de Gestió d'Ajuts Universitaris i de Recerca 2017/SGR-292
Drets:	Aquest document està subjecte a una llicència d'ús Creative Commons. Es permet la reproducció total o parcial, la distribució, la comunicació pública de l'obra i la creació d'obres derivades, fins i tot amb finalitats comercials, sempre i quan es reconegui l'autoria de l'obra original.
Llengua:	Anglès
Document:	Article ; recerca ; Versió publicada
Matèria:	FePd alloy ; Electrodeposition ; Sputtering ; Thin films ; Magnetic properties ; Mechanical properties ; Stripe domains ; Perpendicular magnetic anisotropy
Publicat a:	Science and Technology of Advanced Materials, Vol. 21, Issue 1 (July 2020) , p. 424-434, ISSN 1878-5514

DOI: 10.1080/14686996.2020.1780097
PMID: 32939168

11 p, 11.4 MB

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