Molecular Layer Deposition of Zeolitic Imidazolate Framework-8 Films
Smets, Jorid (University of Antwerp. Department of Bioscience Engineering)
Cruz, Alexander John (University of Leuven)
Rubio-Giménez, Víctor (University of Leuven)
Tietze, Max L. (University of Leuven)
Kravchenko, Dmitry E. (University of Leuven)
Arnauts, Giel (University of Leuven)
Matavž, Aleksander (University of Leuven)
Wauteraerts, Nathalie (University of Leuven)
Tu, Min (University of Leuven)
Marcoen, Kristof (Vrije Universiteit Brussel. Department of Materials and Chemistry)
Imaz, Inhar (Institut Català de Nanociència i Nanotecnologia)
Maspoch Comamala, Daniel (Institut Català de Nanociència i Nanotecnologia)
Korytov, Maxim (Imec)
Vereecken, Philippe M. (Imec)
De Feyter, Steven (KU Leuven. Department of Chemistry)
Hauffman, Tom (Vrije Universiteit Brussel. Department of Materials and Chemistry)
Ameloot, Rob (University of Leuven)

Fecha:	2023
Resumen:	Vapor-phase film deposition of metal-organic frameworks (MOFs) would facilitate the integration of these materials into electronic devices. We studied the vapor-phase layer-by-layer deposition of zeolitic imidazolate framework 8 (ZIF-8) by consecutive, self-saturating reactions of diethyl zinc, water, and 2-methylimidazole on a substrate. Two approaches were compared: (1) Direct ZIF-8 "molecular layer deposition" (MLD), which enables a nanometer-resolution thickness control and employs only self-saturating reactions, resulting in smooth films that are crystalline as-deposited, and (2) two-step ZIF-8 MLD, in which crystallization occurs during a postdeposition treatment with additional linker vapor. The latter approach resulted in a reduced deposition time and an improved MOF quality, i. e. , increased crystallinity and probe molecule uptake, although the smoothness and thickness control were partially lost. Both approaches were developed in a modified atomic layer deposition reactor to ensure cleanroom compatibility.
Ayudas:	European Commission 716472 Agencia Estatal de Investigación SEV-2017-0706 European Commission 765378 European Commission 730872
Derechos:	Aquest material està protegit per drets d'autor i/o drets afins. Podeu utilitzar aquest material en funció del que permet la legislació de drets d'autor i drets afins d'aplicació al vostre cas. Per a d'altres usos heu d'obtenir permís del(s) titular(s) de drets.
Lengua:	Anglès
Documento:	Article ; recerca ; Versió acceptada per publicar
Materia:	Deposition of metals ; Electronics devices ; Film deposition ; Metalorganic frameworks (MOFs) ; Molecular layer deposition ; Phase layers ; Vapor Phase ; Vapor phasis ; Vapour-phase ; Zeolitic imidazolate framework-8
Publicado en:	Chemistry of materials, Vol. 35, Issue 4 (February 2023) , p. 1684-1690, ISSN 1520-5002

DOI: 10.1021/acs.chemmater.2c03439

Postprint 10 p, 957.2 KB

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Documentos de investigación > Documentos de los grupos de investigación de la UAB > Centros y grupos de investigación (producción científica) > Ciencias > Institut Català de Nanociència i Nanotecnologia (ICN2)
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