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Molecular Layer Deposition of Zeolitic Imidazolate Framework-8 Films
Smets, Jorid (University of Antwerp. Department of Bioscience Engineering)
Cruz, Alexander John (Katholieke Universiteit te Leuven (1970-))
Rubio-Giménez, Víctor (Katholieke Universiteit te Leuven (1970-))
Tietze, Max L. (Katholieke Universiteit te Leuven (1970-))
Kravchenko, Dmitry E. (Katholieke Universiteit te Leuven (1970-))
Arnauts, Giel (Katholieke Universiteit te Leuven (1970-))
Matavž, Aleksander (Katholieke Universiteit te Leuven (1970-))
Wauteraerts, Nathalie (Katholieke Universiteit te Leuven (1970-))
Tu, Min (Katholieke Universiteit te Leuven (1970-))
Marcoen, Kristof (Vrije Universiteit Brussel. Department of Materials and Chemistry)
Imaz, Inhar (Institut Català de Nanociència i Nanotecnologia)
Maspoch, Daniel (Institut Català de Nanociència i Nanotecnologia)
Korytov, Maxim (Imec)
Vereecken, Philippe M. (Imec)
De Feyter, Steven (Katholieke Universiteit te Leuven (1970- ). Department of Chemistry)
Hauffman, Tom (Vrije Universiteit Brussel. Department of Materials and Chemistry)
Ameloot, Rob (Katholieke Universiteit te Leuven (1970-))

Data: 2023
Resum: Vapor-phase film deposition of metal-organic frameworks (MOFs) would facilitate the integration of these materials into electronic devices. We studied the vapor-phase layer-by-layer deposition of zeolitic imidazolate framework 8 (ZIF-8) by consecutive, self-saturating reactions of diethyl zinc, water, and 2-methylimidazole on a substrate. Two approaches were compared: (1) Direct ZIF-8 "molecular layer deposition" (MLD), which enables a nanometer-resolution thickness control and employs only self-saturating reactions, resulting in smooth films that are crystalline as-deposited, and (2) two-step ZIF-8 MLD, in which crystallization occurs during a postdeposition treatment with additional linker vapor. The latter approach resulted in a reduced deposition time and an improved MOF quality, i. e. , increased crystallinity and probe molecule uptake, although the smoothness and thickness control were partially lost. Both approaches were developed in a modified atomic layer deposition reactor to ensure cleanroom compatibility.
Ajuts: European Commission 716472
Agencia Estatal de Investigación SEV-2017-0706
European Commission 765378
European Commission 730872
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Llengua: Anglès
Document: Article ; recerca ; Versió acceptada per publicar
Matèria: Deposition of metals ; Electronics devices ; Film deposition ; Metalorganic frameworks (MOFs) ; Molecular layer deposition ; Phase layers ; Vapor Phase ; Vapor phasis ; Vapour-phase ; Zeolitic imidazolate framework-8
Publicat a: Chemistry of materials, Vol. 35, Issue 4 (February 2023) , p. 1684-1690, ISSN 1520-5002

DOI: 10.1021/acs.chemmater.2c03439


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Documents de recerca > Documents dels grups de recerca de la UAB > Centres i grups de recerca (producció científica) > Ciències > Institut Català de Nanociència i Nanotecnologia (ICN2)
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 Registre creat el 2024-10-17, darrera modificació el 2026-07-13



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