| Home > Articles > Published articles > A robust and automated methodology for the analysis of Time-Dependent Variability at transistor level |
| Date: | 2020 |
| Abstract: | In the past few years, Time-Dependent Variability has become a subject of growing concern in CMOS technologies. In particular, phenomena such as Bias Temperature Instability, Hot-Carrier Injection and Random Telegraph Noise can largely affect circuit reliability. It becomes therefore imperative to develop reliability-aware design tools to mitigate their impact on circuits. To this end, these phenomena must be first accurately characterized and modeled. And, since all these phenomena reveal a stochastic nature for deeply-scaled integration technologies, they must be characterized massively on devices to extract the probability distribution functions associated to their characteristic parameters. In this work, a complete methodology to characterize these phenomena experimentally, and then extract the necessary parameters to construct a Time-Dependent Variability model, is presented. This model can be used by a reliability simulator. |
| Grants: | Agencia Estatal de Investigación TEC201675151-C3-R Agencia Estatal de Investigación BES2017-080160 |
| Rights: | Aquest document està subjecte a una llicència d'ús Creative Commons. Es permet la reproducció total o parcial, la distribució, i la comunicació pública de l'obra, sempre que no sigui amb finalitats comercials, i sempre que es reconegui l'autoria de l'obra original. No es permet la creació d'obres derivades. |
| Language: | Anglès |
| Document: | Article ; recerca ; Versió acceptada per publicar |
| Subject: | Bias temperature instability ; BTI ; Characterization ; CMOS ; HCI ; Hot-carrier injection ; Random telegraph noise ; Reliability ; RTN ; Simulation ; TDV ; Time-dependent variability |
| Published in: | Integration, Vol. 72 (May 2020) , p. 13-20, ISSN 0167-9260 |
Postprint 11 p, 2.3 MB |