Ultralow-dielectric-constant amorphous boron nitride - Hong, Seokmo (Ulsan National Institute of Science and Technology. Department of Chemistry) ; Lee, Chang-Seok (Samsung Advanced Institute of Technology. Inorganic Material Lab.) ; Lee, Min-Hyun (Samsung Advanced Institute of Technology. Inorganic Material Lab.) ; Lee, Yeongdong (Ulsan National Institute of Science and Technology. School of Materials Science and Engineering) ; Ma, Kyung Yeol (Ulsan National Institute of Science and Technology. Department of Energy Engineering) ; Kim, Gwangwoo (Ulsan National Institute of Science and Technology. Department of Chemistry) ; Yoon, Seong In (Ulsan National Institute of Science and Technology. Department of Energy Engineering) ; Ihm, Kyuwook Ihm (Pohang Accelerator Laboratory) ; Kim, Ki-Jeong (Pohang Accelerator Laboratory) ; Shin, Tae Joo (Ulsan National Institute of Science and Technology. Department of Chemistry) ; Kim, Sang Won (Samsung Advanced Institute of Technology. Inorganic Material Lab.) ; Jeon, Eun-chae (University of Ulsan. School of Materials Science and Engineering) ; Jeon, Hansol (Ulsan National Institute of Science and Technology. School of Materials Science and Engineering) ; Kim, Ju-Young (Ulsan National Institute of Science and TechnologY. School of Materials Science and Engineering) ; Lee, Hyung-Ik (Samsung Advanced Institute of Technology. Analytical Engineering Group) ; Lee, Zonghoon (Center for Multidimensional Carbon Materials (Ulsan, Corea del Nord)) ; Antidormi, Aleandro (Institut Català de Nanociència i Nanotecnologia) ; Roche, Stephan (Institut Català de Nanociència i Nanotecnologia) ; Chhowalla, Manish (University of Cambridge. Department of Materials Science & Metallurgy) ; Shin, Hyeon-Jin (Samsung Advanced Institute of Technology. Inorganic Material Lab.) ; Shin, Hyeon Suk (Ulsan National Institute of Science and Technology. Low-Dimensional Carbon Materials Center)