![]() |
|||||||||||||||
![]() |
Cerca | Lliura | Ajuda | Servei de Biblioteques | Sobre el DDD | Català English Español |
Pàgina inicial > Articles > Articles publicats > Low-Temperature Growth of Axial Si/Ge Nanowire Heterostructures Enabled by Trisilane |
Data: | 2017 |
Resum: | Axial Si/Ge heterostructure nanowires, despite their promise in applications ranging from electronics to thermal transport, remain notoriously difficult to synthesize. Here, we grow axial Si/Ge heterostructures at low temperatures using a Au catalyst with a combination of trisilane and digermane. This approach yields, as determined with detailed electron microscopy characterization, arrays of epitaxial Si/Ge nanowires with excellent morphologies and purely axial composition profiles. Our data indicate that heterostructure formation can occur via the vapor-liquid-solid or vapor-solid-solid mechanism. These findings highlight the importance of precursor chemistry in semiconductor nanowire synthesis and open the door to Si/Ge nanowires with programmable quantum domains. |
Ajuts: | Agència de Gestió d'Ajuts Universitaris i de Recerca 2014/SGR-1638 Ministerio de Economía y Competitividad SEV-2013-0295 Ministerio de Economía y Competitividad MAT2014-59961-C2-2-R |
Drets: | Tots els drets reservats. |
Llengua: | Anglès |
Document: | Article ; recerca ; Versió acceptada per publicar |
Matèria: | Composition profile ; Low temperature growth ; Low temperatures ; Nanowire heterostructures ; Precursor chemistry ; Semiconductor nanowire ; Thermal transport ; Vapor liquid solids |
Publicat a: | Chemistry of materials, Vol. 29, Núm. 8 (April 2017) , p. 3397-3402, ISSN 1520-5002 |
Post-print 9 p, 7.7 MB |