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| Pàgina inicial > Articles > Articles publicats > Statistical Reproducibility of Selective Area Grown InAs Nanowire Devices |
| Data: | 2024 |
| Resum: | New approaches such as selective area growth (SAG), where crystal growth is lithographically controlled, allow the integration of bottom-up grown semiconductor nanomaterials in large-scale classical and quantum nanoelectronics. This calls for assessment and optimization of the reproducibility between individual components. We quantify the structural and electronic statistical reproducibility within large arrays of nominally identical selective area growth InAs nanowires. The distribution of structural parameters is acquired through comprehensive atomic force microscopy studies and transmission electron microscopy. These are compared to the statistical distributions of the cryogenic electrical properties of 256 individual SAG nanowire field effect transistors addressed using cryogenic multiplexer circuits. Correlating measurements between successive thermal cycles allows distinguishing between the contributions of surface impurity scattering and fixed structural properties to device reproducibility. The results confirm the potential of SAG nanomaterials, and the methodologies for quantifying statistical metrics are essential for further optimization of reproducibility. |
| Ajuts: | European Commission 716655 European Commission 866158 Agència de Gestió d'Ajuts Universitaris i de Recerca 2021/SGR-00457 Agencia Estatal de Investigación CEX2021-001214-S |
| Drets: | Aquest material està protegit per drets d'autor i/o drets afins. Podeu utilitzar aquest material en funció del que permet la legislació de drets d'autor i drets afins d'aplicació al vostre cas. Per a d'altres usos heu d'obtenir permís del(s) titular(s) de drets. |
| Llengua: | Anglès |
| Document: | Article ; recerca ; Versió sotmesa a revisió |
| Matèria: | Nanowires ; Selective area growth ; Semiconductors ; Multiplexers ; Reproducibility |
| Publicat a: | Nano letters, Vol. 24, Issue 22 (May 2024) , p. 6553-6559, ISSN 1530-6992 |
Preprint 10 p, 11.4 MB |